Yunyou Lu
The Hong Kong University of Science and Technology
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9.3 Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
Mengyuan Hua, The Hong Kong University of Science and TechnologyYunyou Lu, The Hong Kong University of Science and TechnologyShenghou Liu, Xiamen San'an Integrated Circuit Co., Ltd.Cheng Liu, Xiamen San'an Integrated Circuit Co., Ltd.Kai Fu, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceYong Cai, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceBaoshun Zhang, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceKevin J. Chen, The Hong Kong University of Science and Technology