10.2.2023 Reduction in Scattered Particles Contamination in Inductively Coupled Plasma Etching Systems for High Volume High Yield Production

Mohammadsadegh Beheshti, Skyworks Solutions Inc.
Samuel Mony, Skyworks Solutions, Inc.
Nercy Ebrahimi, Skyworks Solution Inc.
Tom Brown, Skyworks Solutions, Inc.

10.2.2023 – Beheshti Paper