A. Wang

Forge Nano

  • 12.0.2.2024 Enhanced Dielectric Performance of HfO2 Thin Films Via Novel Atomic Layer Deposition Conversion at Production Speed and Efficiency

    D. Lindblad, Forge Nano
    S. Harris, Forge Nano
    A. Wang, Forge Nano
    L. Mueller, Forge Nano
    A. Dameron, Forge Nano
    M. Weimer, Forge Nano

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