Dmitriy Marinskiy

Semilab SDI, Tampa, FL,
  • Micro-scale Imaging of Electrical Activity of Yield Killer Defects in 4H-SiC with Charge Assisted KFM and UV-Photoluminescence

    J. Lagowski, Semilab SDI
    Marshall Wilson, Semilab SDI, Tampa, FL,
    David Greenock, X-Fab
    Dmitriy Marinskiy, Semilab SDI, Tampa, FL,
    A. Savtchouk, Semilab SDI
    Anthony Ross III, Semilab SDI
    Carlos Almeida, Semilab SDI
    B. Schrayer, Semilab SDI
    John D’Amico, Semilab SDI

    In this work we compare non-contact charge-voltage imaging and UV-photoluminescence (UV-PL) imaging of yield killer defects in epitaxial 4H-SiC wafers.  Two significant findings are based on macro- and micro-scale imaging, respectively.  1- Whole wafer images demonstrate that only a fraction of the UV-PL defects in triangular, downfall and carrot categories are electrically active. 2- Micro-scale images reveal similarities and differences between PL and electrical defect images.  Presented for the first time, micrometer resolution leakage patterns within triangular defects are consistent with the microstructure modeling in reference 1. The results imply that the depletion layer leakage within killer defects corresponds to exposed 3C-SiC polytypes. This leakage may be a consequence of the lower 2.2eV energy gap of 3C-SiC compared to 3.3eV in 4H-SiC.

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  • 11.2 Bias Stress-Induced Interfacial Instability Characterization in Oxidized SiC with Novel Non-contact Approach

    Marshall Wilson, Semilab SDI, Tampa, FL,
    A. Savtchouk, Semilab SDI
    Dmitriy Marinskiy, Semilab SDI, Tampa, FL,
    J. Lagowski, Semilab SDI
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  • May 19, 2022 // 1:50pm

    17.2 Top Surface Edge Contact for Wafer Level Electrical Characterization of 2DEG in AlGaN/GaN on Semi-insulating Wafers

    Dmitriy Marinskiy, Semilab SDI, Tampa, FL,
    B. Schrayer, Semilab SDI
    Mark Benjamin, Lehighton Electronics Inc,
    J. Lagowski, Semilab SDI
    Marshall Wilson, Semilab SDI, Tampa, FL,
    D. Nguyen, Semilab LEI, Lehighton, PA
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  • 2.4.2021 The Phenomenon of Charge Activated Visibility of Electrical Defects In 4H-SiC; Application for Comprehensive Non-Contact Electrical and UV-PL Imaging and Recognition of Critical Defects

    M. Wilson, Semilab SDI
    David Greenock, X-Fab
    Dmitriy Marinskiy, Semilab SDI, Tampa, FL,
    Carlos Almeida, Semilab SDI
    John D’Amico, Semilab SDI
    J. Lagowski, Semilab SDI
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  • 2.6.2021 Kelvin Force Microscopy and Micro-Raman Correlation Study of Triangular Defects in 4H-SiC

    Dmitriy Marinskiy, Semilab SDI, Tampa, FL,
    M. Wilson, Semilab SDI
    Carlos Almeida, Semilab SDI
    S. Savtchouk, Semilab SDI,
    J. Lagowski, Semilab SDI
    S. Toth, Semilab ZRT
    L. Badeeb, Semilab ZRT
    A. Faragó, Semilab ZRT
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  • 10B.2 – Macro and Micro-Scale Non-Contact Imaging of Electrically Active Extended Defects in Merged PiN Schottky Diode Devices

    F. Faisal, Nexperia
    N. Steller, Nexperia
    R. Karhu, Fraunhofer IISB
    B. Kallinger, Fraunhofer IISB
    G. Polisski, Semilab Germany GmbH
    M. Wilson, Semilab SDI
    A. Savtchouk, Semilab SDI
    L. Guitierrez, Semilab SDI
    Carlos Almeida, Semilab SDI
    C. Soto, Semilab SDI
    B. Wilson, Semilab SDI
    Dmitriy Marinskiy, Semilab SDI, Tampa, FL,
    A. Wincukiewicz, Semilab SDI
    J. Lagowski, Semilab SDI

    10B.2 Final.2025

    Abstract
    This study presents a novel approach to device yield estimation based on the non-contact, corona-based QUAD(Quality, Uniformity, and Defects) technique for inline defect mapping in SiC epitaxial layers. The approach is applied to a merged PiN Schottky diode manufacturing process and is compared to final wafer level electrical data. A new analysis method for QUAD defect mapping is introduced, incorporating die yield bin maps based on indie depletion voltage values, allowing for a direct comparison with final electrical device performance. Micro-scale, QUAD and voltage data within each individual diode can gain further insight into the electrical nature of the defects causing the device failure. The results demonstrate a strong correlation between the inline QUAD bin map results and final device electrical properties, highlighting the potential of QUAD as a practical and powerful inline tool. This technique offers a complementary approach to UVPL defect imaging, identifying electrically active defects and enhancing estimations of the final production yield.