GaN is a promising material for more efficient high frequency and high voltage power switching. However, GaN still is not the common material for power electronics due to immature substrate, homoepitaxial growth, and processing technology. Electroluminescence is a promising method to predict failure points due to high field stress, which can assist in the separation of inherent defects stemming from substrate quality, and from process-induced defects as well as identify problems related to proper edge termination design. In this work, we compare the Electroluminescence signatures of devices on inhomogeneous substrates to DC I-V behavior to demonstrate the utility of the technique for process monitoring.
Michael Mastro
U.S. Naval Research Laboratory
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Exploring the capability of Hyperspectral Electroluminescence for process monitoring in vertical GaN devices
Karl D. Hobart, U.S. Naval Research LaboratoryMona Ebrish, Vanderbilt University, Nashville, TNTravis J. Anderson, U.S. Naval Research LaboratoryJames Gallagher, U.S. Naval Research LaboratoryJoseph Spencer, U.S. Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryMichael Mastro, U.S. Naval Research LaboratoryDownload Paper -
10.5.2023 Accuracy of Machine Learning Models on Predicting the Properties of Vertical GaN Diodes
James Gallagher, U.S. Naval Research LaboratoryMichael A. Mastro, U.S. Naval Research LaboratoryMona Ebrish, Vanderbilt University, Nashville, TNAlan Jacobs, U.S. Naval Research LaboratoryBrendan. P. Gunning, Sandia National Labs, Albuquerque, NMRobert Kaplar, Sandia National Labs, Albuquerque, NM