T. Yui

Hamamatsu Photonics K.K

  • 11.5.2023 GaN substrate cut-out process and GaN on GaN device thinning process with laser slicing

    A. Tanaka, Institute of Materials and Systems for Sustainability, Nagoya University
    K. Matsushima, Institute of Materials and Systems for Sustainability, Nagoya University
    T. Aratani, Hamamatsu Photonics K.K
    K. Hara, Hamamatsu Photonics K.K
    D. Kawaguchi, Hamamatsu Photonics K.K
    H. Watanabe, Institute of Materials and Systems for Sustainability, Nagoya University
    T. Kanemura, Institute of Materials and Systems for Sustainability, Nagoya University
    Y. Nagasato, MIRISE Technologies Corporation
    M. Nagaya, MIRISE Technologies Corporation
    Yoshio Honda, Institute of Materials and Systems for Sustainability, Nagoya University
    A. Wakejima, Nagoya Institute of Technology
    Y. Ando, Institute of Materials and Systems for Sustainability, Nagoya University
    S. Onda, Institute of Materials and Systems for Sustainability, Nagoya University
    J. Suda, Institute of Materials and Systems for Sustainability, Nagoya University

    11.5.2023_May17th_at_0510pm_AtsushiTanaka