Tom Brown

Skyworks Solutions, Inc.

  • 9.2 Impact of Loading Effect on Retrograde Profile of CAMP Negative Photoresist in Metal Lift-off Applications

    Sarang Kulkarni, Skyworks Solutions, Inc.
    Tom Brown, Skyworks Solutions, Inc.
    Shiban Tiku, Skyworks Solutions, Inc.
    Manjeet Singh, Skyworks Solutions, Inc.
    Download Paper

  • 9.3 Evolution and Challenges of a TaN Resistor Lift-off Process from a Lithography Perspective

    Tom Brown, Skyworks Solutions, Inc.
    Shiban Tiku, Skyworks Solutions, Inc.
    Sarang Kulkarni, Skyworks Solutions, Inc.
    Manjeet Singh, Skyworks Solutions, Inc.
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  • 4.1 Challenges for Establishing a High Volume, High Yielding BiHEMT Manufacturing Process

    Jiang Li, Skyworks Solutions, Inc.
    Tom Brown, Skyworks Solutions, Inc.
    Mehran Janani, Skyworks Solutions, Inc.
    Jiro Yota
    Cristian Cismaru, Skyworks Solutions, Inc.
    Manjeet Singh, Skyworks Solutions, Inc.
    Mike Sun, Skyworks Solutions, Inc.
    Ravi Ramanathan
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  • 10.2.2023 Reduction in Scattered Particles Contamination in Inductively Coupled Plasma Etching Systems for High Volume High Yield Production

    Mohammadsadegh Beheshti, Skyworks Solutions Inc.
    Samuel Mony, Skyworks Solutions, Inc.
    Nercy Ebrahimi, Skyworks Solution Inc.
    Tom Brown, Skyworks Solutions, Inc.

    10.2.2023 – Beheshti Paper

  • 11.1.2.2024 Optimization of Photolithography Process for BiHEMT Gate Layer with High Critical Dimension Uniformity

    Stephanie Y. Chang, Skyworks Solutions, Inc.
    Tom Brown, Skyworks Solutions, Inc.
    Randy Bryie, Skyworks Solutions, Inc.
    Rainier Lee, Skyworks Solutions, Inc.
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