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V. Odnoblyudov
Qromis, inc.
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8.1.2021 Demonstration of High-quality GaN Epitaxy on 200 mm Engineered Substrates for Vertical Power Device Fabrication
K. Geens, imec,H. Hahn, AIXTRON SEH. Liang, imec,M. Borga, imecD. Cingu, imecS. You, imecM. Marx, AIXTRON SER. Oligschlaeger, AIXTRON SED. Fahle, AIXTRON SEM. Heuken, AIXTRON SEV. Odnoblyudov, Qromis, inc.O. Aktas, Qromis, Inc.C. Basceri, Qromis, Inc.S. Decoutere, imecDownload Paper -
8.1.3.2024 High Temperature Operation of GaN High Electron Mobility Transistors on Large-Area Engineered Substrates for Extreme Environments
James Spencer Lundh, National Research Council Postdoctoral Fellow, Residing at NRLAlan Jacobs, U.S. Naval Research LaboratoryMichael E. Liao, National Research Council Postdoctoral Fellow, Residing at NRLJoseph Spencer, U.S. Naval Research LaboratoryGeoffrey M. Foster, U.S. Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVladimir Odnoblyudov, Qromis, Inc.Marko J. Tadjer, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryTravis J. Anderson, U.S. Naval Research LaboratoryLoading...