20.7 Process Condition Optimization for High Throughput and High Efficiency Growth of the AlGaN/GaN HEMT Structure in a Single Wafer Rotating Disc MOCVD Reactor

Bojan Mitrovic, Veeco MOCVD Operations.
Randhir Bubber, Veeco Instruments
Jie Su, Veeco Instruments
Earl Marcelo, Veeco MOCVD Operations
Mandar Deshpande, Veeco Instruments Inc.
Ajit Paranjpe, Veeco Instruments
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