20.7 Process Condition Optimization for High Throughput and High Efficiency Growth of the AlGaN/GaN HEMT Structure in a Single Wafer Rotating Disc MOCVD Reactor - CS MANTECH Conference CS MANTECH Conference

20.7 Process Condition Optimization for High Throughput and High Efficiency Growth of the AlGaN/GaN HEMT Structure in a Single Wafer Rotating Disc MOCVD Reactor

Bojan Mitrovic, Veeco MOCVD Operations.

Randhir Bubber, Veeco Instruments

Jie Su, Veeco Instruments

Earl Marcelo, Veeco MOCVD Operations

Mandar Deshpande, Veeco Instruments Inc.

Ajit Paranjpe, Veeco Instruments

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