Andrew Clark

IQE, Cardiff, UK
  • April 30, 2019 // 4:30pm – 5:00pm

    4.3 Epitaxial material for RF filters

    Andrew Clark, IQE, Cardiff, UK
    Rytis Dargis, Translucent Inc.
    Mukul Debnath, IQE plc
    Robert Yanka, IQE plc
    Rodney Pelzel, IQE, Cardiff, UK
    Minyo Park, Georgia Institute of Technology
    DeaGyu Kim, Georgia Institute of Technology
    Azadeh Ansari, Georgia Institute of Technology
    Download Paper
  • May 11, 2022 // 2:40pm

    9.3 First Demonstration Of High Performance 940nm VCSELs Grown On 200mm Diameter Substrates

    Andrew D. Johnson, IQE, Cardiff, UK
    Sung Wook Lim, IQE, Cardiff, UK
    Andrew Joel, IQE, Cardiff, UK
    Andrew Clark, IQE, Cardiff, UK
    Matthew Geen, IQE, Cardiff, UK
    Rodney Pelzel, IQE, Cardiff, UK
    Wang Wang, IQE, Cardiff, UK
    Loader Loading...
    EAD Logo Taking too long?

    Reload Reload document
    | Open Open in new tab

    Download [551.11 KB]

    Download Paper

  • 14.2.2023 Assessment of 1.3-?m InAs QD Edge-Emitting Lasers Grown on Large Area GaAs Substrates

    Sara Gillgrass, Cardiff University
    Craig Allford, Cardiff University
    Mukul Debnath, IQE plc
    Andrew Clark, IQE, Cardiff, UK
    Peter M. Smowton, Cardiff University

    14.2.2023 CS_MANTECH-2023_14.2_Final

  • 11A.3 – High Volume Quantum Dot Epitaxial Wafer Manufacturing to Meet Demands of AI Driven Data Centers

    Andrew Clark, IQE, Cardiff, UK
    K. Sautter, IQE, Cardiff, UK
    Mark Furlong, IQE, Cardiff, UK

    11A.3 Final.2025

    Abstract
    Cost efficiency for data centers is providing an opportunity for quantum dot laser technology to move from a niche photonic process to a widely-adopted technology. This in turn drives the need for high-volume manufacturing methodologies in the production of QD epitaxial wafers. At the same time, integration of QDLs with Si photonics is an emerging focus. Epitaxy foundries such as IQE are drawing on their history of high-volume wafer manufacture to meet and manage the complexity associated with scaling QD epitaxy combined with end user device and integration needs. IQE is also able to leverage its capabilities to support next generation and emerging end user applications.