NGMS reports the maturation of a novel GaN based 3D transistor with state of the art RF switch performance, named the SLCFET (Super Lattice Castellated Field Effect Transistor), with an RF switch FOM greater than 1.8 THz. The configured process has undergone reliability qualification for production.
Georges Siddiqi
HRL Laboratories
-
Productization of the Superlattice Castellated Field Effect Transistor
Justin Parke, Northrop Grumman Mission SystemsI. Wathuthanthri, Northrop Grumman (MS), Linthicum, MDKen Nagamatsu, Northrop Grumman Mission SystemsJosephine Chang, Northrop Grumman Mission SystemsGeorges Siddiqi, HRL LaboratoriesR. Lewis, Northrop Grumman (MS), Linthicum, MDRobert Howell, Northrop Grumman Mission SystemsDownload Paper -
3B.2 – A Fabrication Process for Airbox Encapsulation of T-Gates
Georges Siddiqi, HRL LaboratoriesD. Berkoh, HRL LaboratoriesL. Cazares, HRL LaboratoriesA. Chao, HRL LaboratoriesAbstract
A fabrication process for encapsulating T-gates with a robust SiN/SiO2 airbox has been developed at HRL, allowing for further passivation layers to be deposited, without creating additional parasitic capacitances that would degrade radio frequency (RF) performance of devices. This process has been demonstrated and validated on HRL’s T3 GaN devices, maintaining fT/fMAX after SiN and SiO2 coverage of the entire transistor. This robust inorganic airbox can be either used to enable wafer-level passivation of inorganic materials for complex BEOL fabrication and/or addition of moisture barrier layers to improve device reliability – all without altering device performance.
