J. Schuur

Coherent Corp.
  • May 12, 2022 // 11:50am

    15.4 Ion Implantation Simulation and Optimization in Semiconductor Compounds

    J. A. Turcaud, Coherent Corp.
    J. Schuur, Coherent Corp.
    R. Pong, COHERENT - INNOViON
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  • 5.1.2023 Isolation in Compound Semiconductors and the Risk of Neutron Generation with Implantation of Light Ions

    J. A. Turcaud, Coherent Corp.
    C. Heckman, COHERENT - INNOViON
    V. Heckman, COHERENT - INNOViON
    A. Hassan, COHERENT - INNOViON
    R. Pong, COHERENT - INNOViON
    J. Schuur, Coherent Corp.

    5.1.2023_Turcaud_Neutron_TALK_CS_Mantech_2023_v3

  • 4.1.3.2024 Influence of Carbon Capping Materials during High Temperature Annealing on Surface, Defects and Dopant Profile in SiC

    J. A. Turcaud, Coherent Corp.
    D. Lee, Coherent Corp.
    D. Rossman, Coherent Corp.
    J. Schuur, Coherent Corp.
    R. Chebi, Coherent Corp.
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