In this work we present a systematic study on the conduction properties in vertical GaN trench MISFETs grown and manufactured on different free standing GaN substrates. It is shown that devices manufactured on ammonothermal substrates have superior conduction current density higher than 4 kA/cm2, specific on‑state resistance as low as 1.1 ± 0.1 mWcm2 and channel sheet resistance of 19.6 ± 0.9 Wmm. It is further shown that scaling these devices to large gate periphery is not limited by current spreading in the drift region, low channel mobility or by self‑heating. The conduction properties of devices manufactured on ammonothermal GaN substrates are found to be the most suitable for pulsed laser driving applications.
Frank Brunner
Ferdinand-Braun-Institut (FBH)
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The influence of the GaN substrate types and the active area scaling design on the conduction properties of vertical GaN MISFETs for laser driving applications
Joachim Würfl, Ferdinand-Braun-Institut, Berlin, GermanyEldad Bahat Treidel, Ferdinand-Braun-Institut (FBH)Oliver Hilt, Ferdinand-Braun-Institut (FBH)Veit Hoffman, Ferdinand-Braun-Institut, Leibniz-Institut für HöchstfrequenztechnikFrank Brunner, Ferdinand-Braun-Institut (FBH)Bernd Janke, Ferdinand-Braun-Institut, Leibniz-Institut für HöchstfrequenztechnikNicole Bickel, Ferdinand-Braun-Institut, Leibniz-Institut für HöchstfrequenztechnikHossein Yazdani, Ferdinand-Braun-Institut (FBH)Hassan Gargouri, SENTECH Instruments GmbHDownload Paper -
3.3 Novel approach for ED transistors integration in GaN HEMT technology
Konstantin Y Osipov, Ampleon Netherlands B.V.I. Ostermay, Ferdinand-Braun-Institut (FBH)Frank Brunner, Ferdinand-Braun-Institut (FBH) -
May 12, 2022 // 11:10am
14.2 Areal Vertical-Transmission Line Model Measurement for Drift Region Characterization in Vertical GaN-Based Devices
Eldad Bahat Treidel, Ferdinand-Braun-Institut (FBH)Frank Brunner, Ferdinand-Braun-Institut (FBH)Oliver Hilt, Ferdinand-Braun-Institut (FBH)Joachim Würfl, Ferdinand-Braun-Institut, Berlin, GermanyMihaela Wolf, Ferdinand-Braun-Institut (FBH)Download PaperLoading... -
9.3.2023 Drift Region Epitaxy Development and Characterization for High Blocking Strength and Low Specific Resistance in Vertical GaN Based Devices
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2.1.4.2024 Overlapping source field plate process module for high-voltage GaN HFETs with low off state leakage currents
Houssam Halhoul, Ferdinand-Braun-Institut (FBH)Ralph-Stephan Unger, Ferdinand-Braun-Institut (FBH)Frank Brunner, Ferdinand-Braun-Institut (FBH)Oliver Hilt, Ferdinand-Braun-Institut (FBH)Loading... -
4.1.4.2024 Wafer Bow Tuning with Stealth Laser Patterning for Vertical High Voltage Devices with Thick GaN Epitaxy on Sapphire Substrates
Enrico Brusaterra, Ferdinand-Braun-Institut (FBH)Eldad Bahat Treidel, Ferdinand-Braun-Institut (FBH)Alexander Külberg, Ferdinand-Braun-Institut (FBH)Frank Brunner, Ferdinand-Braun-Institut (FBH)Mihaela Wolf, Ferdinand-Braun-Institut (FBH)Oliver Hilt, Ferdinand-Braun-Institut (FBH)Loading...