N. Mahadik
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16.3 Evaluation of GaN Device Structures on 150 mm GaN on Engineered Substrates
Download PaperKarl D. Hobart, U.S. Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryAnindya Nath, George Mason UniversityJennifer Hite, U.S. Naval Research LaboratoryN. Mahadik, U.S. Naval Research LaboratoryFritz Kub, Naval Research LaboratoryOzgur Aktas, QROMIS, USAVladimir Odnoblyudov, QROMIS, USACem Basceri, QROMIS, USA -
9.4.2023 Scalable Manufacturing of Planar, Large-Area 1.2kV and 3.3kV Vertical GaN PiN Diodes
Alan Jacobs, U.S. Naval Research LaboratoryMona Ebrish, NRC Postdoc Fellow Residing at the U.S. Naval Research LaboratoryJames Gallagher, U.S. Naval Research LaboratoryMarko J. Tadjer, U.S. Naval Research LaboratoryJames Spencer Lundh, National Research Council Postdoctoral Fellow, Residing at NRLJennifer K. Hite, Naval Research LaboratoryN. Mahadik, U.S. Naval Research LaboratoryRobert Kaplar, Sandia National Labs, Albuquerque, NMO. Aktas, Sandia National Labs, Albuquerque, NM -
11.3.2023 Structural and Electrical Characterization of Schottky Barrier Diodes on 100 mm HVPE β-Ga2O3 Epiwafer Technology
Marko J. Tadjer, U.S. Naval Research LaboratoryJames Gallagher, ASEE Postdoctoral Fellow Residing at NRLN. Mahadik, U.S. Naval Research LaboratoryHannah N. Masten, National Research Council Postdoctoral Fellow, Residing at NRLJames Spencer Lundh, National Research Council Postdoctoral Fellow, Residing at NRLAkito Kuramata, Novel Crystal Technology, Inc -
10B.1 – Mapping Defects in SiC Wafers Using a Multi-Channel Convolutional Neural Network
James Gallagher, U.S. Naval Research LaboratoryN. Mahadik, U.S. Naval Research LaboratoryR. E. Stahlbush, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryM.A. Mastro, U.S. Naval Research LaboratoryAbstract
Though wide bandgap semiconductors offer superior performance to its Si based counterpart, the current state of the art manufacturing technology produces several defects preventing devices from performing optimally. Particularly in SiC, the methods for detecting extended defects such as threading edge dislocations (TED), threading screw dislocations (TSD), basel plane dislocations (BPD), stacking faults, and polytype inclusions are well established; however, automated quantitative analysis is challenging due to the variable size, shape, and intensity of these numerous defects. This study focuses on developing machine learning models using multiple measurements with different techniques including x-ray topography (XRT) and ultraviolet photoluminescence (UVPL) to locate and quantify the microscopic defects on a macroscopic scale.
